- System capability
- Assembly simultaneously: max 2 inlets+ max 3 detectors(FID, TCD, ECD, FPD and NPD)
- Automatic control can be done from local keyboard and networked PC
- Auto sampler is compatible
- 6-channel independent temperature control
- EPC/AFC gas system
- Carrier gas via EPC/AFC, auxiliary gas via AFS(Advanced Flow Scout) or mechanical regulator
- Carrier gas and make-up gas selectable: He, H2, N2 and Ar. Every carrier gas system can control via constant-pressure, constant-flow, programmable pressure and programmable flow mode, also can calibrate with He, H2, N2 and Ar
- Psi, KPa, Bar units selectable
- Pressure control range: 1~90Psi, Pressure accuracy: 0.01Psi, Programmable pressure ramp RSD ≤0.5%
- Flow rate control range: 0~200ml/min, flow rate accuracy: 0.1ml/min, flow rate RSD≤0.1%
- Column oven
Column oven dimension |
260×250×150mm |
control range |
RT+6℃~399℃(0.1℃ increment) |
Programming temp.-ramp |
8 steps |
ramp speed |
0.1~40℃≤1 minute(0.1℃ increment) |
Fast cool down speed |
200~100℃≤3 minutes |
accuracy |
±0.1℃ |
Max run time |
999.99 minutes |
- Inlets
- Packed purge injection port(PPIP)
- Split/splitless capillary port(S/SL)
- Max temperature: 400℃
- Detectors
Detector |
Max operating temp. |
Limit of detection |
Baseline noise |
Baseline drift |
Linear dynamic range |
FID |
400℃ |
≤5.0×10^-12g/s(N-C16) |
≤2×10^-13 A |
5×10^-13A/30 min |
≥10^7 |
TCD |
400℃ |
≥8000mV.ml/mg(N-C16) |
≤20uV |
≤100uV/30min |
≥10^4 |
ECD |
350℃ |
≤ 1×10^-13g/ml(γ-666) |
≤20uV |
≤50uV/30min |
≥10^4 |
FPD |
400℃ |
S: ≤5.0×10^-11g/s P: ≤1.4×10^-12g/s |
≤2×10^-11A | ≤4×10^-11 A/30min | S: ≥10^2 P: ≥10^3 |
NPD |
400℃ |
N: ≤1×10^-12g/s(Azobenzene) |
≤4×10^-13A |
2×10^-12 A/30min |
N: ≥10^3 |
- Workstation and data communications
- Counter-control workstation
- Output range: -1500~+1500mV
- Sampling speed: 60 times/sec
- Basic info
Voltage |
220V±10%, 50Hz |
Power |
2500W |
Net dimension |
566.2×3×498mm |
Net weight |
42KG |
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